5th INTERNATIONAL WORKSHOP ON
ELECTRODEPOSITED NANOSTRUCTURES

7-9 June 2007, Iasi, Romania
ABSTRACTS
 

 
Complementary information of the composition analysis and direct depth profile imaging of electrodeposited multilayers

László Pétera, Gábor L. Katonab, Zoltán Berényib, Kálmán Vadb, Enikö Tóth-Kádára, József Pádára and Imre Bakonyia

a Research Institute for Solid State Physics and Optics,
    Hungarian Academy of Sciences,
    1525 Budapest, P.O.Box 49, Hungary
b Nuclear Research Institute, Hungarian Academy of
    Sciences, 4031 Debrecen, P.O. Box 51, Hungary
E-mail: lpeter@szfki.hu

Homogeneous component distribution is a key issue in the electrodeposition of nanostructures from magnetic alloy films to nanowires. The deposition of alloys of magnetic metals takes place with anomalous codeposition, which makes the distribution of the metals uneven along the growth direction. This inhomogeneity in the component distribution can be detected from both nondestructive electron probe microanalysis (EPMA) and depth profile imaging. The two methods need to be employed parallel to obtain maximum information.

EPMA yields the average composition of the samples. This method is quite sensitive to the change in the ratio of the magnetic metals with layer thicknesses, current density and other deposition condition. However, its result is an integral average only, and the evolution of the composition from pulse start to pulse end can be estimated only because the analytical function describing the composition change along the thickness is generally not known.

Depth profile analysis reveals the local composition. However, the surface roughness of the sample and the selectivity in sample sputtering makes the composition vs. depth function faded.

The results of both "average" and "local" methods are presented and compared in the presentation for electrodeposited CoNiCu/Cu multilayers.

   
   

Depth profile analysis of two Si/Cr/Cu(20nm)/[Cu(20nm)/CoNiCu(50nm)/Cu(20nm)] samples prepared with high (top) and low (bottom) CoNiCu current density.
 

 
 
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