5th INTERNATIONAL WORKSHOP ON ELECTRODEPOSITED NANOSTRUCTURES 7-9 June 2007, Iasi, Romania |
ABSTRACTS |
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EPMA yields the average composition of the samples. This method is quite sensitive to the change in the ratio of the magnetic metals with layer thicknesses, current density and other deposition condition. However, its result is an integral average only, and the evolution of the composition from pulse start to pulse end can be estimated only because the analytical function describing the composition change along the thickness is generally not known. Depth profile analysis reveals the local composition. However, the surface roughness of the sample and the selectivity in sample sputtering makes the composition vs. depth function faded. The results of both "average" and "local" methods are presented and compared in the presentation for electrodeposited CoNiCu/Cu multilayers.         Depth profile analysis of two Si/Cr/Cu(20nm)/[Cu(20nm)/CoNiCu(50nm)/Cu(20nm)] samples prepared with high (top) and low (bottom) CoNiCu current density. |
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